Anik, M. 2004. Reduction characteristics of iodate ion on copper: Application to copper chemical mechanical polishing. Journal of Applied Electrochemistry , vol.34, no.9 , 963-969.

Anik, M., (2004). Reduction characteristics of iodate ion on copper: Application to copper chemical mechanical polishing. Journal of Applied Electrochemistry , vol.34, no.9, 963-969.

Anik, MUSTAFA. "Reduction characteristics of iodate ion on copper: Application to copper chemical mechanical polishing," Journal of Applied Electrochemistry , vol.34, no.9, 963-969, 2004

Anik, MUSTAFA. "Reduction characteristics of iodate ion on copper: Application to copper chemical mechanical polishing." Journal of Applied Electrochemistry , vol.34, no.9, pp.963-969, 2004

Anik, M. (2004) . "Reduction characteristics of iodate ion on copper: Application to copper chemical mechanical polishing." Journal of Applied Electrochemistry , vol.34, no.9, pp.963-969.

@article{article, author={MUSTAFA ANIK}, title={Reduction characteristics of iodate ion on copper: Application to copper chemical mechanical polishing}, journal={Journal of Applied Electrochemistry}, year=2004, pages={963-969} }