Anik, M. 2005. Selection of an oxidant for copper chemical mechanical polishing: Copper-iodate system. JOURNAL OF APPLIED ELECTROCHEMISTRY , vol.35, no.1 , 1-7.

Anik, M., (2005). Selection of an oxidant for copper chemical mechanical polishing: Copper-iodate system. JOURNAL OF APPLIED ELECTROCHEMISTRY , vol.35, no.1, 1-7.

Anik, MUSTAFA. "Selection of an oxidant for copper chemical mechanical polishing: Copper-iodate system," JOURNAL OF APPLIED ELECTROCHEMISTRY , vol.35, no.1, 1-7, 2005

Anik, MUSTAFA. "Selection of an oxidant for copper chemical mechanical polishing: Copper-iodate system." JOURNAL OF APPLIED ELECTROCHEMISTRY , vol.35, no.1, pp.1-7, 2005

Anik, M. (2005) . "Selection of an oxidant for copper chemical mechanical polishing: Copper-iodate system." JOURNAL OF APPLIED ELECTROCHEMISTRY , vol.35, no.1, pp.1-7.

@article{article, author={MUSTAFA ANIK}, title={Selection of an oxidant for copper chemical mechanical polishing: Copper-iodate system}, journal={JOURNAL OF APPLIED ELECTROCHEMISTRY}, year=2005, pages={1-7} }