Osseo-Asare, K. Et Al. 1999. Chemical Mechanical Polishing of Tungsten: Effect of Tungstate Ion on the Electrochemical Behavior of Tungsten. Electrochemical and Solid-State Letters , vol.2, no.3 , 143-144.

Osseo-Asare, K., Anik, M., & DeSimone, J., (1999). Chemical Mechanical Polishing of Tungsten: Effect of Tungstate Ion on the Electrochemical Behavior of Tungsten. Electrochemical and Solid-State Letters , vol.2, no.3, 143-144.

Osseo-Asare, K., MUSTAFA ANIK, And J. DeSimone. "Chemical Mechanical Polishing of Tungsten: Effect of Tungstate Ion on the Electrochemical Behavior of Tungsten," Electrochemical and Solid-State Letters , vol.2, no.3, 143-144, 1999

Osseo-Asare, K. Et Al. "Chemical Mechanical Polishing of Tungsten: Effect of Tungstate Ion on the Electrochemical Behavior of Tungsten." Electrochemical and Solid-State Letters , vol.2, no.3, pp.143-144, 1999

Osseo-Asare, K. Anik, M. And DeSimone, J. (1999) . "Chemical Mechanical Polishing of Tungsten: Effect of Tungstate Ion on the Electrochemical Behavior of Tungsten." Electrochemical and Solid-State Letters , vol.2, no.3, pp.143-144.

@article{article, author={K. Osseo-Asare Et Al. }, title={Chemical Mechanical Polishing of Tungsten: Effect of Tungstate Ion on the Electrochemical Behavior of Tungsten}, journal={Electrochemical and Solid-State Letters}, year=1999, pages={143-144} }