Boron thin film deposition by using Thermionic Vacuum Arc (TVA) technology

AKAN T., Ekem N., Pat S., İŞSEVER U. G., Balbag M. Z., Cenik M. I., ...Daha Fazla

MATERIALS LETTERS, cilt.61, sa.1, ss.23-26, 2007 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 61 Sayı: 1
  • Basım Tarihi: 2007
  • Doi Numarası: 10.1016/j.matlet.2006.03.144
  • Dergi Adı: MATERIALS LETTERS
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Sayfa Sayıları: ss.23-26
  • Anahtar Kelimeler: thermionic vacuum arc, boron, thin film, AFM, high-resolution electron microscopy, COATINGS
  • Eskişehir Osmangazi Üniversitesi Adresli: Evet

Özet

In this paper a new technology for boron thin film deposition is presented. The film in high vacuum conditions is condensing on the sample from the plasma state of the vapor phase of the anode material, generated by a Thermionic Vacuum Arc (TVA). Boron coating is one of the technologies recently considered to be of special interest due to the qualities of boron. The aim of this paper is to present the use of TVA technology for boron coating. (c) 2006 Elsevier B.V. All rights reserved.