Anti-adherent activity of nano-coatings deposited by thermionic vacuum arc plasma on <i>C. albicans</i> biofilm formation

Topcu Ersöz M. B., Mumcu E., Avukat E. N., Akay C., Pat S., Erdönmez D.

INTERNATIONAL JOURNAL OF ARTIFICIAL ORGANS, cilt.46, sa.8-9, ss.520-526, 2023 (SCI-Expanded) identifier identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 46 Sayı: 8-9
  • Basım Tarihi: 2023
  • Doi Numarası: 10.1177/03913988231178041
  • Dergi Adı: INTERNATIONAL JOURNAL OF ARTIFICIAL ORGANS
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus, Aerospace Database, BIOSIS, Biotechnology Research Abstracts, CINAHL, Communication Abstracts, Compendex, EMBASE, Metadex, Civil Engineering Abstracts
  • Sayfa Sayıları: ss.520-526
  • Anahtar Kelimeler: Candida albicans, crystal violet, MTT, polymethylmethacrylate, thermionic vacuum arc plasma
  • Eskişehir Osmangazi Üniversitesi Adresli: Evet

Özet

Background: The purpose of this study was to analyze the anti-adherent activity of nano-coatings deposited by Thermionic Vacuum Arc plasma on C. albicans ATCC 10231 biofilm. Materials and methods: A total of 80 disc-shaped (2 x 10 mm) polymethymethacrylate samples were prepared and divided into four groups with 10 samples in each group (Control, ZnO, SnO2, Ag) (n = 10). Using thermionic vacuum arc plasma, they were coated with ZnO, SnO 2, and Ag. 3-(4,5-dimethyl-thiazol-2-yl)-2,5-diphenyltetrazolium bromide (MTT) and Crystal Viole (CV) assays were conducted for biofilm quantification. Scanning electron microscopy (SEM) was used to observe biofilm images of C. albicans biofilm. Results: MTT and CV mean values differ statistically significantly between all groups (p <= 0.05). The SnO2 group had the lowest mean value, whereas the control group received the highest value. Conclusion: SnO2 coating shown greater anti-adherent activity than either metal oxides. C. albicans biofilm formation on denture base surfaces is reduced following Thermionic Vacuum Arc plasma coating with SnO2.