Dissolution kinetics of WO3 in acidic solutions
JOURNAL OF APPLIED ELECTROCHEMISTRY, cilt.36, sa.5, ss.603-608, 2006 (SCI-Expanded, Scopus)
- Yayın Türü: Makale / Tam Makale
- Cilt numarası: 36 Sayı: 5
- Basım Tarihi: 2006
- Doi Numarası: 10.1007/s10800-006-9113-3
- Dergi Adı: JOURNAL OF APPLIED ELECTROCHEMISTRY
- Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
- Sayfa Sayıları: ss.603-608
- Anahtar Kelimeler: CMP, dissolution kinetics, rate constant, tungsten, tungsten oxide, ANODIC DISSOLUTION, AQUEOUS AMMONIA, TUNGSTEN, FILMS, BEHAVIOR, GROWTH, ALUMINA
- Eskişehir Osmangazi Üniversitesi Adresli: Evet
Özet
Potentiostatic polarization and rotating disk electrode techniques were used to obtain the rate constant for the dissolution of electrochemically-formed (at 1 V) WO3 on tungsten (W) in acidic solutions. The corresponding rate constant for the chemical dissolution of WO3(s) powder was found by measuring the dissolved tungsten concentration as a function of time and pH. The chemical dissolution experiments supported the view that the rate-determining step in the anodic reaction of W in acidic solution is the chemical dissolution of WO3(s) formed on the metal surface. Zeta potential measurements gave the isoelectric point (iep) of the WO3(s) powder as pH 1.5, a value that was somewhat smaller than the point of zero charge (pzc) of WO3(s) formed on W metal (pH 2.5). This difference was attributed to the highly hydrated nature of the oxide film formed on W metal in aqueous systems.