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ECS Journal of Solid State Science and Technology, cilt.10, sa.10, 2021 (SCI-Expanded)
© 2021 The Electrochemical Society ("ECS"). Published on behalf of ECS by IOP Publishing Limited.Zinc oxide (ZnO), which has inimitable properties, is broadly used in technology. Here, ZnO was doped with tungsten trioxide (WO3) and deposited onto glass and silicon using a thermionic vacuum arc (TVA) method. TVA is a physical depositionmethod that does not necessitate a buffer gas and relies on plasma technology. The structural and morphological effects of WO3 on ZnO were investigated using atomic force microscopy and field emission scanning electron microscopy. Important data, such as Skewness, Kurtosis, root-mean-square (nm), grain size, and lack of cracking on the surface was obtained, which reveals significant information about the surface. The thickness of the deposited layers on glass and silicon was 20 and 60 nm, respectively. The optical properties of the thin film, such as absorption, transmittance, reflection, and refractive index transparency on the glass, were also investigated by applying an optical interferometer and UV-Vis spectrophotometer. The optical bandgap for the deposited sample was 3.02 eV. The presence of tungsten trioxide in the sample increases the range of absorbance. Our findings show that WO3 is a promising material to obtain low band gap energy for ZnO.