Boron processes using thermionic vacuum arc

AKAN T., Karakas E.

OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS, cilt.8, ss.480-482, 2014 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 8
  • Basım Tarihi: 2014
  • Dergi Adı: OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Sayfa Sayıları: ss.480-482
  • Anahtar Kelimeler: Vacuum arc plasma, TVA, Boron, Material processing, THIN-FILM DEPOSITION, VAPORS
  • Eskişehir Osmangazi Üniversitesi Adresli: Evet

Özet

Boron is one of the most difficult materials to process because of its high melting and boiling temperature. Thermionic Vacuum Arc (TVA) is an externally heated cathode arc which can be established in high vacuum condition, in vapors of the anode material. The TVA has proved to be a highly efficient method for producing droplet-free plasmas in metal vapors where electron bombardment results in the efficient target heating and subsequent evaporation at the anode, with vaporization temperatures of over 3000 K. In this paper, boron evaporation property before TVA ignition and XPS analyses of boron thin film deposited by TVA are presented.