Boron processes using thermionic vacuum arc

AKAN T., Karakas E.

OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS, vol.8, pp.480-482, 2014 (SCI-Expanded) identifier identifier

  • Publication Type: Article / Article
  • Volume: 8
  • Publication Date: 2014
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.480-482
  • Keywords: Vacuum arc plasma, TVA, Boron, Material processing, THIN-FILM DEPOSITION, VAPORS
  • Eskisehir Osmangazi University Affiliated: Yes


Boron is one of the most difficult materials to process because of its high melting and boiling temperature. Thermionic Vacuum Arc (TVA) is an externally heated cathode arc which can be established in high vacuum condition, in vapors of the anode material. The TVA has proved to be a highly efficient method for producing droplet-free plasmas in metal vapors where electron bombardment results in the efficient target heating and subsequent evaporation at the anode, with vaporization temperatures of over 3000 K. In this paper, boron evaporation property before TVA ignition and XPS analyses of boron thin film deposited by TVA are presented.