Effect of fluorine doping on the improvement of electrical and photocatalytic properties of ZnO films

KARAKAYA S., Kaba L.

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, cilt.130, sa.3, 2024 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 130 Sayı: 3
  • Basım Tarihi: 2024
  • Doi Numarası: 10.1007/s00339-024-07312-1
  • Dergi Adı: APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus, Academic Search Premier, Aerospace Database, Chemical Abstracts Core, Chimica, Communication Abstracts, Compendex, INSPEC, Metadex
  • Anahtar Kelimeler: F-doped ZnO, Hall effect, Methylene blue, Photocatalytic, USP technique
  • Eskişehir Osmangazi Üniversitesi Adresli: Evet

Özet

ZnO:F thin films were produced by ultrasonic spray pyrolysis (USP) technique. For photovoltaic and photocatalytic applications, the properties of ZnO films have been tried to be improved by adding the flourine (F) element. The average optical transmittance was higher than 85%. Photoluminescence (PL) spectra depict blue, green and yellow emission in deposited films. Photocatalytic activity of ZnO and ZnO:F thin films was evaluated with methylene blue (MB) organic pollutant under UV irradiation. 5% doped ZnO:F film successfully decomposed similar to 80% using MB as photocatalyst. The lowest resistivity (3.54 x 10(-3) Omega cm), high carrier concentration (2.52 x 10(20) cm(-3)) and high hall mobility (8.28 cm(2)V(-1) s(-1)) were observed in ZnO:F (5%) film. With this study, it was concluded that F-doped ZnO films were effective in the degradation of MB, which is widely used in the food and pollutant industries. Therefore, it makes ZnO:F films a promising material in both optoelectronic and photocatalytic applications due to their optimum properties.