Study on Termionic Vacuum ARC- A novel and advanced technology for surface coating

PAT S., Ekem N., AKAN T., Küsmüş Ö., Demirkol S., Vladoiu R., ...More

Journal of Optoelectronics and Advanced Materials, vol.7, no.5, pp.2495-2499, 2005 (SCI-Expanded) identifier

  • Publication Type: Article / Abstract
  • Volume: 7 Issue: 5
  • Publication Date: 2005
  • Journal Name: Journal of Optoelectronics and Advanced Materials
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.2495-2499
  • Eskisehir Osmangazi University Affiliated: Yes


The Thermionic Vacuum Arc (TVA) discharge is an original technology for thin film deposition in high vacuum conditions. The originality of this method consists in the fact that the substrate is bombarded with energetic ions (of 200-500 eV) of the material to be deposited just during deposition and no buffer gas is needed. The TVA plasma is ignited in the vapors of the anode material by heated cathode electron bombardment. The electron temperature of the Thermionic Vacuum Arc in silver vapor plasma was determined by using the optical emission spectroscopy (OES) obtained for different arc parameters.