Carbon thin film deposition by Thermionic Vacuum Arc (TVA)

Ekem N., Musa G., Pat S., Balbag Z., Cenik I., Vladoiu R.

JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, vol.10, no.3, pp.672-674, 2008 (SCI-Expanded) identifier

  • Publication Type: Article / Article
  • Volume: 10 Issue: 3
  • Publication Date: 2008
  • Journal Name: JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.672-674
  • Eskisehir Osmangazi University Affiliated: Yes

Abstract

Carbon thin films were deposited on the Si and glass substrate by using TVA method Carbon films were deposited (thickness appr. 50-90 nm) by TVA at about 10-5 Torr. The refractive index (n) and thickness of the deposited thin films were measured by Filmmetrics F20 device. Atomic force microscopies (AFM) were used for the surface morphology of the deposited film. In addition, Roughness of the deposited carbon thin films was realized by using AFM Roughness mode.