Titanium oxidation by pulsed oxygen plasma


Balbag M. Z. , Pat S., Cenik I., Ekem N., AKAN T. , BAKSAN B. , ...More

JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, vol.10, no.3, pp.680-682, 2008 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 10 Issue: 3
  • Publication Date: 2008
  • Title of Journal : JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS
  • Page Numbers: pp.680-682

Abstract

The high oxygen affinity of titanium can be used to improve the surface hardness and wear resistance of titanium. The aim of the present study is controlled preparation and characterization of oxidized titanium surfaces. Such surfaces are of general technological interest. The samples (17 x 4 x 0,3 mm) of commercially pure titanium were oxidated by means of the high voltage pulsed discharge. The discharge chamber was introduced an oven system which reaches the elevated temperature of 900 degrees C. The oxidation of titanium sample was performed for various oven temperatures (300, 500 and 700 degrees C) but fixed discharge parameters (interelectrode distance, discharge current and discharge pressure). The microstructure of the oxidated titanium samples was examined by optical metallographic techniques and Scanning Electron Microscopy (SEM). The thickness and the hardness of the samples were measured.