Al2O3 THIN FILM DEPOSITION USING THERMIONIC VACUUM ARC

Akan T., Karakaş E., Musa G.

SIGMA JOURNAL OF ENGINEERING AND NATURAL SCIENCES, vol.23, no.3, pp.18-23, 2005 (SCI-Expanded)

  • Publication Type: Article / Article
  • Volume: 23 Issue: 3
  • Publication Date: 2005
  • Journal Name: SIGMA JOURNAL OF ENGINEERING AND NATURAL SCIENCES
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED)
  • Page Numbers: pp.18-23
  • Eskisehir Osmangazi University Affiliated: Yes

Abstract

The thermionic vacuum arc (TVA) is a new technique for the deposition of thin metallic and nonmetallic films. TVA discharge is established in vacuum between a heated cathode (a tungsten filament) and an anode (a tungsten crucible filled with Al2O3 pellets). TVA discharges in Al2O3 vapors were generated and thin Al2O3 films were deposited on the glass substrates using TVA. The surfaces of thin Al2O3 films were examined using a Metallurgical Optical Microscope (MOM) and Scanning Electron Microscope (SEM). Al2O3 thin films have been analyzed using X-ray diffraction (XRD) method.