Production and characterization of iridium oxide films by ultrasonic chemical spray pyrolysis

Gencyilmaz O., Atay F., Akyüz İ.

JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, vol.17, pp.395-402, 2015 (SCI-Expanded) identifier identifier

  • Publication Type: Article / Article
  • Volume: 17
  • Publication Date: 2015
  • Journal Name: JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED)
  • Page Numbers: pp.395-402
  • Keywords: Iridium oxide, Spectroscopic ellipsometry, X-ray diffraction, Atomic force microscopy, Two-probe technique, PULSED-LASER DEPOSITION, THIN-FILMS, OPTICAL-PROPERTIES, SUBSTRATE-TEMPERATURE, ELECTRODES, THICKNESS, MOLYBDENUM, TRANSITION, CONSTANT
  • Eskisehir Osmangazi University Affiliated: Yes

Abstract

Iridium oxide films were deposited onto glass substrate at 300+/-5 degrees C by using ultrasonic chemical spray pyrolysis technique. The as-deposited films were annealed at 600 degrees C in air medium for 3 h. The effects of anneal on structural, optical, morphological and electrical properties was studied. Effects of annealed iridium oxide on the crystalline nature, morphological, optical and electrical properties of the deposited films were analyzed by using X-ray diffraction, atomic force microscopy, UV-visible spectrophotometer and two-probe method, respectively. The X-ray diffraction studies showed that unannealed iridium oxide films were non-crystalline phase (Ir2O3). At annealing temperature of 600 degrees C for 3 h, the films were fully transformed to polycrystalline phase of IrO2. Also, the room temperature electrical resistivity of these films decreased and transmittance values increased with annealing process.