Characterization of AlF3 Thin Films Deposited by Thermionic Vacuum Arc


Pat S., Cetin N. E. , Ekem N., Balbag M. Z. , Korkmaz S.

MATERIALS FOCUS, vol.3, no.1, pp.72-74, 2014 (Peer-Reviewed Journal) identifier

  • Publication Type: Article / Article
  • Volume: 3 Issue: 1
  • Publication Date: 2014
  • Doi Number: 10.1166/mat.2014.1150
  • Journal Name: MATERIALS FOCUS
  • Page Numbers: pp.72-74
  • Eskisehir Osmangazi University Affiliated: Yes

Abstract

Aluminum fluoride (AlF3) thin films were deposited using Thermionic Vacuum Arc (TVA) method on glass substrates under the high vacuum conditions with energetic ions bombardment. Ion energy plays an important role to surface composition. In this study, an amorphous AlF3 film using with high ion energy was deposited and characterized at the first time. The deposition parameters, micro structural properties, surface morphology, and optical properties of deposited AlF3 thin films have been presented. According to results, deposited AlF3 thin films exhibit amorphous, high transparent, low roughness and smooth. The presented transmittance and refractive index spectra of the deposited AlF3 thin films are in good agreement with literature in visible region. According to reflection spectra, deposited AlF3 thin films also show anti reflective (AR) properties.