Deposition of Al doped ZnO thin films on the different substrates with radio frequency magnetron sputtering
JOURNAL OF NON-CRYSTALLINE SOLIDS, vol.359, pp.69-72, 2013 (SCI-Expanded, Scopus)
- Publication Type: Article / Article
- Volume: 359
- Publication Date: 2013
- Doi Number: 10.1016/j.jnoncrysol.2012.09.024
- Journal Name: JOURNAL OF NON-CRYSTALLINE SOLIDS
- Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
- Page Numbers: pp.69-72
- Eskisehir Osmangazi University Affiliated: Yes
Abstract
This work focuses on fabrication, characterization and understanding of the physical properties of transparent and conductive Al-Zn alloy thin films. Films were deposited onto glass slides, polyethylene terephthalate (PET) and silicon by radio-frequency (RF) reactive magnetron sputtering technique, using Al-Zn alloy targets. In order to generate oxidation process of Al-Zn alloys, Ar:O-2 gas mixing in (5:5) ratio was used. Transmittances, reflectance, refractive index and thicknesses of AZO films were measured by UV-Vis spectrophotometry and interferometry respectively. Crystallographic properties were investigated by X-ray diffraction (XRD) method. Surface morphologies of produced films were characterized by atomic force microscopy (AFM) and also field emission scanning electron microscopy (FESEM). (C) 2012 Elsevier B.V. All rights reserved.