Structural, Surface, and Optical Properties of Nitrogen-Doped Al:ZnO (NAZO) Thin Films Produced by a Thermionic Vacuum Arc Deposition Technology


ÖZER Z. N., ÖZKAN M., PAT S.

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, sa.1, 2025 (SCI-Expanded) identifier

Özet

Nitrogen (N)-doped Al:ZnO (NAZO) thin films were deposited on glass and indium tin oxide (ITO) coated glass by a thermionic vacuum arc (TVA) technique. The structural, surface morphology, and optical properties of the produced thin films were characterized by X-ray diffractometry (XRD), atomic force microscopy (AFM), and ultraviolet-visible spectroscopy. The microstructure properties of the produced thin films on two substrates were compared, and metal oxide phases were observed in the XRD patterns and photoluminescence spectra. 2.75, 3.10, and 3.30 eV band gaps were detected. The transmittance values were approximately 90% and 60% for the film deposited onto uncoated and ITO-coated glass, respectively. According to field-emission scanning electron microscopy and atomic force microscopy images, the crystallite size is nanoscale, and its dimensions are approximately 60 and 20 nm for the film deposited onto uncoated and ITO-coated glass substrates, respectively. Atomic ratios of zinc/aluminum were 9.25/0.56, and 5.42/0.22 for uncoated and ITO-coated glass substrate, respectively. All samples were coated with the same coating process, and no post-annealing process was applied to the sample.