JOURNAL OF APPLIED ELECTROCHEMISTRY, vol.35, no.1, pp.1-7, 2005 (SCI-Expanded)
Diagnostic criteria were developed to elucidate the reduction mechanism of an oxidant on a copper (Cu) surface at the corrosion potential. The corrosion potential of Cu tu was measured for various pH and iodate (IO3-) concentrations using the rotating disk electrode technique. According to the measured corrosion potentials, IO3- was an effective CMP oxidant only below pH Application of the diagnostic criteria on the Cu - IO3- system showed that the reduction of IO3- on Cu was under the mixed kinetic and diffusion control at the corrosion potentia l below pH 3. Above pH 3, however, the anodic process dominated over the cathodic process.